Femto- and nanosecond laser treatment of doped polymethylmethacrylate

Femto- and nanosecond laser ablation of polymethylmethacrylate (PMMA) and PMMA doped with a linear absorber was investigated in the infrared spectral region. Ablation thresholds were determined and incubation phenomena were identified. The 'degree' of incubation was calculated employing a phenomenological model. The influence of the pulse duration on the machining quality of the polymers was examined. The presence of an absorbing chromophore is not a prerequisite for a controllable fs-laser structuring in contrast to the ns-treatment. Surface swelling always accompanied ablation.