کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567335 | 1503713 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
In situ X-ray diffraction study of crystallization process of GeSbTe thin films during heat treatment
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: In situ X-ray diffraction study of crystallization process of GeSbTe thin films during heat treatment In situ X-ray diffraction study of crystallization process of GeSbTe thin films during heat treatment](/preview/png/9567335.png)
چکیده انگلیسی
The crystallization processes of the Ge2Sb2Te5 thin film used for PD and DVD-RAM were studied in its realistic optical disk film configurations for the first time by X-ray diffraction using an intense X-ray beam of a synchrotron orbital radiation facility (SPring-8) and in situ quick detection with a Position-Sensitive-Proportional-Counter. The dependence of the amorphous-to-fcc phase-change temperature T1 on the rate of temperature elevation Ret gave an activation energy Ea: 0.93Â eV much less than previously reported 2.2Â eV obtained from a model sample 25-45 times thicker than in the real optical disks. The similar measurement on the Ge4Sb1Te5 film whose large reflectance change attains the readability by CD-ROM drives gave Ea: 1.13Â eV with larger T1 than Ge2Sb2Te5 thin films at any Ret implying a lower sensitivity in erasing as well as a better data stability of the phase-change disk.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 281-284
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 281-284
نویسندگان
Naohiko Kato, Ichiro Konomi, Yoshiki Seno, Tomoyoshi Motohiro,