کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567476 | 1503717 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of post-annealing treatment on the structure properties of ZnO films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Highly oriented polycrystalline ZnO films were deposited on Si substrate by rf reactive sputtering technique. X-ray diffraction (XRD), atomic force microscope (AFM) and the refractive index were employed to analyze the influence of the post-annealing treatment on the structural properties of ZnO thin films. It has been found that the grain size of ZnO thin films increases with increasing the annealing temperature, the shift of the diffraction peak position from its normal powder value was observed. AFM analysis shows that the surface roughness of ZnO films is very low at temperature between 250 and 600 °C. The packing density investigation shows ZnO films can obtain high packing densities (above 0.973) in the annealing temperature rang from 450 to 600 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 241, Issues 3â4, 15 March 2005, Pages 303-308
Journal: Applied Surface Science - Volume 241, Issues 3â4, 15 March 2005, Pages 303-308
نویسندگان
Z.B. Fang, Z.J. Yan, Y.S. Tan, X.Q. Liu, Y.Y. Wang,