کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9572504 | 1503708 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth of SrTiO3 films on Si(0Â 0Â 1)-Sr(2Â ÃÂ 1) surfaces
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The growth and characterization of a SrTiO3 film by molecular beam deposition process have been studied. After Sr deposition on the chemically formed SiO2/Si surface, a stable and well-ordered Si(0 0 1)-Sr(2 Ã 1) surface was formed. The SrTiO3 films were grown on the Si(0 0 1)-Sr(2 Ã 1) surface at 80 °C in a molecular oxygen partial pressure of approximately 3 Ã 10â7 Torr and subsequently in situ post-annealed at various high temperatures without oxygen supply in ultra-high vacuum (<2.5 Ã 10â9 Torr). The combined reflection high-energy electron diffraction, X-ray diffraction and atomic force microscopy analyses suggest that the SrTiO3 film grown at 80 °C is amorphous nature. The lowest post-annealing temperature from amorphous-to-crystal transformation of the SrTiO3 film is approximately 485 °C. The quality of the crystalline SrTiO3 films is further improved by post-annealing at temperatures between 600 and 700 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 249, Issues 1â4, 15 August 2005, Pages 419-424
Journal: Applied Surface Science - Volume 249, Issues 1â4, 15 August 2005, Pages 419-424
نویسندگان
Md. Nurul Kabir Bhuiyan, Hiroaki Kimura, Toyokazu Tambo, Chiei Tatsuyama,