کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9594585 1507968 2005 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Atomistic modeling of step formation and step bunching at the Ge(1 0 5) surface
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Atomistic modeling of step formation and step bunching at the Ge(1 0 5) surface
چکیده انگلیسی
We investigate possible step geometries on the rebonded-step reconstructed Ge(1 0 5) surface. We focus our attention on steps oriented along the [0 1 0] direction, which have been shown to play a key role in the pyramid-to-dome transition during Ge growth on Si(0 0 1). Using molecular dynamics simulations based on the Tersoff potential, we evaluate the step formation energy for several alternative structures. The step-bunching process is also analyzed, showing that one monolayer-high steps are likely to group into multistepped structures. Our results provide support for very recent experiments and modeling on the pyramid-to-dome transition in Ge/Si(0 0 1).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 591, Issues 1–3, 20 October 2005, Pages 23-31
نویسندگان
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