کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9594736 | 1507976 | 2005 | 24 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Atomistic modeling of Ag deposition on the low-index faces of Al and Al deposition on Ag
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The deposition of Ag on low-index surfaces of Al, and the symmetric case of Al on Ag surfaces, are studied by means of a simple modeling approach based on a quantum approximate technique, the BFS method for alloys. For submonolayer deposits of Ag on Al, a preference is seen for growth of close-packed chains along nearest-neighbor directions on (1Â 0Â 0) and (1Â 1Â 0) surfaces, while cluster formation is preferred for growth on Al(1Â 1Â 1). For Al deposition on all three low-index Ag surfaces, diffusion of Al into the Ag surface layers is favored. The behavior seen on the various surfaces is attributed to a competition between the preference for Ag atoms to favor an Al environment, while Al atoms tend to avoid the increased energy associated with having Ag neighbors. The energies of the various atomic configurations are then determined by how the two competing effects manifest themselves for the corresponding geometric arrangements considered.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 583, Issues 2â3, 1 June 2005, Pages 229-252
Journal: Surface Science - Volume 583, Issues 2â3, 1 June 2005, Pages 229-252
نویسندگان
Guillermo Bozzolo, Jorge E. Garcés, Richard J. Smith,