کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9595121 | 1507983 | 2005 | 16 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structure and growth of ultrathin titanium oxide films on Ru(0Â 0Â 0Â 1)
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
Structure, chemical composition and thermal stability of TiOx films with a thickness of up to 3Â ML grown on a Ru(0Â 0Â 0Â 1) substrate were investigated by scanning tunneling microscopy, X-ray photoelectron spectroscopy and Auger electron spectroscopy. The films were prepared by evaporation of Ti in 10â7Â mbar O2 onto Ru(0Â 0Â 0Â 1) at 640Â K, followed by annealing in 10â7Â mbar O2 or in UHV at temperatures between 700Â K and 1000Â K. Depending on the deposition and post-annealing conditions, we find several different structures of the Ti oxide, with the layers post-annealed in an O2 environment being generally better defined than those post-annealed in vacuum. The layers consist of triangular units which coalesce upon annealing. O2 annealing of monolayer films leads to an oxygen deficient TiO2 layer. Annealing to 900-1000Â K changes the structure and composition of the film, a coincidence structure with a Moiré pattern is observed upon O2 annealing.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 576, Issues 1â3, 10 February 2005, Pages 29-44
Journal: Surface Science - Volume 576, Issues 1â3, 10 February 2005, Pages 29-44
نویسندگان
A. Männig, Z. Zhao, D. Rosenthal, K. Christmann, H. Hoster, H. Rauscher, R.J. Behm,