کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9595121 1507983 2005 16 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structure and growth of ultrathin titanium oxide films on Ru(0 0 0 1)
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Structure and growth of ultrathin titanium oxide films on Ru(0 0 0 1)
چکیده انگلیسی
Structure, chemical composition and thermal stability of TiOx films with a thickness of up to 3 ML grown on a Ru(0 0 0 1) substrate were investigated by scanning tunneling microscopy, X-ray photoelectron spectroscopy and Auger electron spectroscopy. The films were prepared by evaporation of Ti in 10−7 mbar O2 onto Ru(0 0 0 1) at 640 K, followed by annealing in 10−7 mbar O2 or in UHV at temperatures between 700 K and 1000 K. Depending on the deposition and post-annealing conditions, we find several different structures of the Ti oxide, with the layers post-annealed in an O2 environment being generally better defined than those post-annealed in vacuum. The layers consist of triangular units which coalesce upon annealing. O2 annealing of monolayer films leads to an oxygen deficient TiO2 layer. Annealing to 900-1000 K changes the structure and composition of the film, a coincidence structure with a Moiré pattern is observed upon O2 annealing.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 576, Issues 1–3, 10 February 2005, Pages 29-44
نویسندگان
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