کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9672237 | 1450565 | 2005 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Threshold voltage instability characteristics of HfO2 dielectrics n-MOSFETs
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
When different polarity of stress, such as positive, negative, and bipolar stress was applied, it was observed that frequency and duty cycle dependencies were still valid in all three conditions. In contrast to positive stress, negative stress showed a decrease in the threshold voltage shift. Bipolar stress resulted in the highest threshold voltage instability, but the degradation in transconductance and subthreshold swing was actually smaller than those in negative unipolar stress. The bulk trap of HfO2 dielectric, which is proportional to its physical thickness, is believed to be the primary factor for threshold voltage shift. AC unipolar operation would allow a higher 10-year lifetime operating voltage than the DC condition. In addition to experimental results, a plausible mechanism has been proposed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 45, Issues 7â8, JulyâAugust 2005, Pages 1051-1060
Journal: Microelectronics Reliability - Volume 45, Issues 7â8, JulyâAugust 2005, Pages 1051-1060
نویسندگان
Se Jong Rhee, Jack C. Lee,