Characterization of crystalline MOCVD SrTiO3 films on SiO2/Si(100)

SrTiO3 thin films (STO), were deposited on Si(100) covered by 2 nm of SiO2, at different temperatures from 450 °C to 850 °C using liquid injection MOCVD, the bimetallic precursor being Sr2Ti2(OiPr)8(tmhd)4. The STO films were analysed by XRD, FTIR, SIMS and TEM. An amorphous layer was observed between STO and SiO2/Si. The nature and thickness of the interlayer were determined, as well as the most favourable conditions for a good quality crystalline STO film, and a reduced interlayer.