کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9672358 | 1450567 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Chemical and diffusion-controlled curing kinetics of an underfill material
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
Curing kinetics of an epoxy-based underfill material with applications in flip chip ball grid array (FC-BGA) packages has been studied using differential scanning calorimetry (DSC). Non-isothermal DSC curves were obtained with heating rates ranging from 0.5 to 10 °C/min. Glass transition temperature as a function of fractional conversion was determined using temperature modulated DSC. Based on these experimental data, non-linear regression technique was used to evaluate the curing kinetics by considering both chemical- and diffusion-controlled reaction processes. As a result, it was determined that the curing reaction can be described by an nth order autocatalytic reaction partially controlled by diffusion, although the diffusion effect is relatively weak. The obtained optimized kinetic parameters allow us to predict the reaction behavior under various application conditions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 45, Issues 3â4, MarchâApril 2005, Pages 689-695
Journal: Microelectronics Reliability - Volume 45, Issues 3â4, MarchâApril 2005, Pages 689-695
نویسندگان
Yi He,