کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9783134 | 1511869 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Energy band diagrams for the photo-electrochemical dissolution of n-Si(1Â 0Â 0) in HF
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Energy band diagrams for the photo-electrochemical dissolution of n-Si(1Â 0Â 0) in HF Energy band diagrams for the photo-electrochemical dissolution of n-Si(1Â 0Â 0) in HF](/preview/png/9783134.png)
چکیده انگلیسی
A technique in combination of theoretical and experimental methods was used to establish the energy band diagrams for the photo-electrochemical dissolution of n-Si(1Â 0Â 0) in various HF solutions. Based on theoretical calculation in the band gap of silicon and experimental measurements in both open circuit potential (OCP) and flatband voltage (Vfb) of the n-Si/HF, we successfully established the energy band diagrams, and estimated the activation energy (Eact) for the photo-electrochemical reaction of the system. The Eact data were advantageous to elucidate the reaction kinetics. The dissolution rate of silicon increased to a maximum with increasing the HF concentration from 0.5 to 2.0Â M; it decreased with further increasing in HF concentrations. This concentration effect could be interpreted in terms of energy band diagrams and the Eact data.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Chemistry and Physics - Volume 91, Issues 2â3, 15 June 2005, Pages 513-517
Journal: Materials Chemistry and Physics - Volume 91, Issues 2â3, 15 June 2005, Pages 513-517
نویسندگان
Wern-Dare Jehng, Jing-Chie Lin, Chien-Ming Lai, Sheng-Long Lee,