کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9783203 | 1511871 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Reflectance spectra and refractive index of a Nd:YAG laser-oxidized Si surface
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
The reflectance spectra and refractive index of Nd:YAG laser-oxidized SiO2 layers with thicknesses from 15 to 75Â nm have been investigated with respect to the laser beam energy density and substrate temperature. Thickness and refractive index of films have been determined from reflectance measurements at normal light incidence in the spectral range 300-800Â nm. It was found that the oxide-growth conditions at higher substrate temperatures and laser powers greater than 3.36Â JÂ cmâ2 provides a better film quality in terms of both optical thickness and refractive index. However, the refractive indices of the films are smaller in the whole spectral range studied as compared to that of conventional thermally grown SiO2. This might be due to the porous structure formed during the laser-assisted oxidation. The results suggest the need of post-oxidation annealing to improve the refractive indices of the films, suitable for Si-device applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Chemistry and Physics - Volume 89, Issues 2â3, 15 February 2005, Pages 316-320
Journal: Materials Chemistry and Physics - Volume 89, Issues 2â3, 15 February 2005, Pages 316-320
نویسندگان
G. Aygun, E. Atanassova, R. Turan, Tz. Babeva,