کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9784102 | 1512029 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A systematic study of the chemical etching process on periodically poled lithium niobate structures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
A systematic analysis on the dynamics of the chemical etching of periodically poled lithium niobate (PPLN) structures grown by off-center Czochralski technique was carried out on crystals prepared under different experimental growth conditions. The etched depth reaches values close to 600Â nm and it does not further increase even after long etching times. However, the lateral etching cannot be neglected when the etching times are higher than 5Â min. The estimation of the domain widths distribution can be affected by artifacts if the etching conditions are not properly chosen. The best structures are obtained for erbium oxide doping level of 0.3Â mol% into the starting melt and the period depends on the pulling and rotational rates instead of on the growing rate. This results support the role of the thermoelectric field in the domain formation at the Curie isotherm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 118, Issues 1â3, 25 April 2005, Pages 150-154
Journal: Materials Science and Engineering: B - Volume 118, Issues 1â3, 25 April 2005, Pages 150-154
نویسندگان
N. Argiolas, M. Bazzan, A. Bernardi, E. Cattaruzza, P. Mazzoldi, P. Schiavuta, C. Sada, U. Hangen,