کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9784110 | 1512029 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Chromium-doped titanium oxide thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Undoped and Cr-doped titanium oxide thin films were deposited by using D.C. reactive sputtering technique. The films, deposited onto unheated glass substrates, show an amorphous structure as observed by XRD. SEM, AFM and EPR experiments evidence that Cr-doped samples are nanocrystalline and they are more compact than the undoped films. It was found that, by chromium doping, some parameters (optical transmittance, optical constants and optical band gap) significantly change. The decrease in optical band gap from 3.27 to 2.91Â eV, means that the material becomes more absorbing by chromium doping and an extension of its photocatalytic activity to the visible part of the absorption spectrum, can be realized.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 118, Issues 1â3, 25 April 2005, Pages 187-191
Journal: Materials Science and Engineering: B - Volume 118, Issues 1â3, 25 April 2005, Pages 187-191
نویسندگان
Diana Mardare, G.I. Rusu, Felicia Iacomi, Mihaela Girtan, Ioan Vida-Simiti,