Effect of ion irradiation on the structural formation of aluminide phases on the Ti substrate during annealing

The aluminum layer on the titanium substrate has been formed by thermal deposition. During annealing on the titanium surface coated by aluminum different aluminide phases are formed successively according to the Ti-Al equilibrium phase diagram and grow in the direction of aluminum. The kinetics of structural formation of the aluminide phases on the titanium surface and the process of microstructural development depend on the thickness of the initial aluminum film. Ion irradiation has a considerable influence on microstructure formation and the kinetics of the reactions that take place during the aluminide phase formation on the titanium surface. Irradiation of the initial aluminum film by titanium ions has a considerable effect on the kinetics of aluminide phase formation on the titanium surface at annealing. Ion irradiation contributes to the development of a more homogeneous structure, stabilizes the Al3Ti phase at 800 °C and activates dramatically the reaction processes at temperatures above 900 °C.