کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9795225 | 1514430 | 2005 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
On the optical, structural, and morphological properties of ZrO2 and TiO2 dip-coated thin films supported on glass substrates
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: On the optical, structural, and morphological properties of ZrO2 and TiO2 dip-coated thin films supported on glass substrates On the optical, structural, and morphological properties of ZrO2 and TiO2 dip-coated thin films supported on glass substrates](/preview/png/9795225.png)
چکیده انگلیسی
This article reports the optical and morphological properties of dip-coated TiO2 and ZrO2 thin films on soda-lime glass substrates by metal-organic decomposition (MOD) of titaniumIV and zirconiumIV acetylacetonates respectively. Thermogravimetric and differential thermal analysis (DTA-TG) were performed on the precursor powders, indicating pure TiO2 anatase and tetragonal ZrO2 phase formation. Phase crystallization processes took place in the range of 300-500 °C for anatase and of 410-500 °C for ZrO2. Fourier Transform Infrared Spectroscopy (FT-IR) was used to confirm precursor bidentate ligand formation with keno-enolic equilibrium character. Deposited films were heated at different temperatures, and their structural, optical and morphological properties were studied by grazing-incidence X-ray Diffraction (GIXRD) and X-Ray Photoelectron Spectroscopy (XPS), Ultraviolet Visible Spectroscopy (UV-Vis), and Atomic Force Microscopy (AFM) respectively. Film thinning and crystalline phase formation were enhanced with increasing temperature upon chelate decomposition. The optimum annealing temperature for both pure anatase TiO2 and tetragonal ZrO2 thin films was found to be 500 °C since solid volume fraction increased with temperature and film refractive index values approached those of pure anatase and tetragonal zirconia. Conditions for clean stoichiometric film formation with an average roughness value of 2 nm are discussed in terms of material binding energies indicated by XPS analyses, refractive index and solid volume fraction obtained indirectly by UV-Vis spectra, and crystalline peak identification provided by GIXRD.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Characterization - Volume 55, Issues 4â5, November 2005, Pages 263-271
Journal: Materials Characterization - Volume 55, Issues 4â5, November 2005, Pages 263-271
نویسندگان
Luisa F. Cueto, Enrique Sánchez, Leticia M. Torres-MartÃnez, Gustavo A. Hirata,