کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9796218 | 1514943 | 2005 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Corrosion resistance and biocompatibility of Ti-Ta alloys for biomedical applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Corrosion resistance, wear resistance and biocompatibility of the studied Ti-Ta alloys with Ta contents of 10, 30 and 70 mass% together with the currently used metallic biomaterials pure titanium (Ti) and Ti-6Al-4V extra low interstitial (ELI) alloy were investigated for biomedical applications. Corrosion resistance was measured by an anodic polarization test using an automatic potentiostat in 5% HCl solution at 310Â K. Wear resistance was evaluated using a pin-on-disk type friction wear test system with a load of 4.9Â N at 310Â K in a simulated body fluid (Ringer's solution), and biocompatibility was judged by evaluating the cyto-toxicity through MTT assay. The passive behaviors are observed for all the studied Ti-Ta alloys, and the TiO2 passive films strengthened by the more stable Ta2O5 passive films result in improved corrosion resistance of the studied Ti-Ta alloys with increasing Ta content. All the studied Ti-Ta alloys are non-cytotoxic like pure Ti. The crystal structure shows little influence on the corrosion resistance and cyto-toxicity of the studied Ti-Ta alloys. The experimental results conform the expected excellent corrosion resistance and biocompatibility of the studied Ti-Ta alloys, which are better than or similar to those of pure Ti or Ti-6Al-4V ELI alloy used as standard biomaterials, suggesting their promising potential for biomedical applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 398, Issues 1â2, 25 May 2005, Pages 28-36
Journal: Materials Science and Engineering: A - Volume 398, Issues 1â2, 25 May 2005, Pages 28-36
نویسندگان
Ying Long Zhou, Mitsuo Niinomi, Toshikazu Akahori, Hisao Fukui, Hiroyuki Toda,