Current-induced butterfly shaped domains and magnetization switching in magnetic tunnel junctions

Patterned magnetic tunnel junctions (MTJs) with the layer structure of Ta (5 nm)/Ni79Fe21 (5 nm)/Cu (20 nm)/Ni79Fe21 (5 nm)/Ir22Mn78 (10 nm)/Co75Fe25 (4 nm)/Al (0.8 nm)-oxide/Co75Fe25 (4 nm)/Ni79Fe21 (20 nm)/Ta (5 nm) were fabricated using magnetron sputtering deposition and lithography. High tunnelling magnetoresistance ratios of 22 and 50% were obtained at room temperature before and after annealing, respectively. The evolution of leaf shaped images was observed via Lorentz transmission electron microscopy (LTEM) on the MTJs, which were deposited on a patterned and carbon-coated transmission electron microscopy grid. These leaf-like LTEM images correspond to a butterfly shaped domain structure that was confirmed by a micromagnetics simulation. When a large DC current or bias voltage was applied across the MTJ, the butterfly-like vortex domain structures could be induced to form in the free layer of the MTJ, resulting in a significant decrease of magnetization in the free layer. The existence of these butterfly shaped domains could be one of the major causes of the bias voltage dependence of the TMR ratio.