کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9801324 | 1515479 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Aligned 1D silicon nanostructure arrays by plasma etching
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
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چکیده انگلیسی
High-density aligned arrays made of one-dimensional (1D) silicon nanostructures, including nanocone, nanorod, and nanowire, are fabricated by plasma etching in a hot-filament chemical vapor deposition apparatus using the gas mixture of hydrogen, nitrogen and methane. The silicon nanocones are crystalline structure and have a uniform apex angle of about 22°. The cones can be coated in situ with an about 3 nm thick amorphous carbon film by increasing the methane concentration in source gases. With gradually decreasing the plasma intensity, the morphologies of the silicon nanostructures evolve along the nanocone-nanorod-nanowire route, and the nanowire becomes amorphous structure. The model for fabrication process of silicon nanostructures with different morphologies will also be suggested.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Science and Technology of Advanced Materials - Volume 6, Issue 7, October 2005, Pages 804-808
Journal: Science and Technology of Advanced Materials - Volume 6, Issue 7, October 2005, Pages 804-808
نویسندگان
X.D. Bai, Zhi Xu, S. Liu, E.G. Wang,