کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9817398 | 1518765 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
EUV emission from xenon in the 10-80Â nm wavelength range using a compact ECR ion source
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
In this work we have studied the generation of EUV light by a novel compact electron cyclotron resonance ion source (CECRIS). The EUV emission diagnostics of the ECR plasma was accomplished by means of a 1.5 m grazing incidence monochromator which was operated in a wavelength range of 4-90 nm under the condition of medium to high resolution to discriminate between spectra arising from different Xeq+ (q = 2-10) charge states. One of the major accomplishments of this study is assignment of numerous new optical transitions for xenon in the 10-80 nm range to create a database for further investigations. High resolution spectra were recorded in the 10-16 nm range confirming significant contributions from highly excited Xe10+ and Xe9+ ionic states. Major outcome of this work is that the Xe10+ ion emission with λ = 13.4 nm may occurs with such a simplified and compact ECR source. The EUV emission of this particular line is of great interest for lithography applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 241, Issues 1â4, December 2005, Pages 23-29
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 241, Issues 1â4, December 2005, Pages 23-29
نویسندگان
H. Merabet, S. Kondagari, R. Bruch, S. Fülling, S. Hahto, K.-L. Leung, J. Reijonen, A.L. Godunov, V.A. Schipakov,