کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9818123 1518776 2005 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The contribution of stable isotopic tracing, narrow nuclear resonance depth profiling, and a simple stochastic theory of charged particle energy loss to studies of the dry thermal oxidation of SiC
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
The contribution of stable isotopic tracing, narrow nuclear resonance depth profiling, and a simple stochastic theory of charged particle energy loss to studies of the dry thermal oxidation of SiC
چکیده انگلیسی
We present the stochastic approach to calculating fast charged particle energy distributions when penetrating matter, and nuclear reaction yield curves obtained when the energy of a beam incident on a target is scanned about the energy of narrow nuclear resonances, such as 18O(p,α)15N at 151 keV. In particular we present new calculations that show the insensitivity of the final calculations to the detailed form of the energy loss distribution assumed for independent single ion-atom collisions. We present application of narrow resonance profiling with 18O stable isotopic tracing to the study of the dry thermal oxidation mechanisms of silicon carbide, yielding insights into the process that cannot be obtained by other means.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 232, Issues 1–4, May 2005, Pages 272-279
نویسندگان
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