The influence of deposition parameters on TiB2 thin films prepared by DC magnetron sputtering

TiB2 coatings were deposited on silicon and steel substrates by DC magnetron sputtering from a stoichiometric target in an Ar inert atmosphere. The dependence of coating morphology and structure on Ar pressure was investigated. The properties of the coatings were examined by AES, AFM, XRD and SEM. The coating morphology and preferential orientation were pressure dependent. Coatings acquired a microhardness of more than 50 GPa.