Application of laser ion source for ion implantation technology

The subject of this contribution is a study of the application of laser-produced ion streams for implantation into different materials. The laser-produced plasma has been used as a source of ions with different charge states and with different kinetic energies for ion implantation into various materials: metals, polymers and semiconductors, in order to modify their properties. The implantation depth was measured using Rutherford backscattering spectroscopy (RBS).