کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9834627 1524912 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fundamental limits on the z-resolution of ion beam patterning of magnetic multilayers
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Fundamental limits on the z-resolution of ion beam patterning of magnetic multilayers
چکیده انگلیسی
We studied the atomic relocation in Ni-Cu and Co-Cu multilayers under Ar+ bombardment, using molecular dynamics simulations. The atomistic mechanisms upon impact are significantly different for the two systems, especially on the monolayer scale: Ar bombardment of Co on Cu is found to lead to dewetting, while bombardment of Ni on Cu is found to lead mostly to formation of an interfacial alloy due to relocated atoms.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Magnetism and Magnetic Materials - Volume 286, February 2005, Pages 181-185
نویسندگان
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