Optical lithography-a historical perspective
Keywords: لیتوگرافی 157 نانومتر; Optical lithography; Photoresist; Phase shifting mask; Optical proximity correction; 157 nm lithography; Immersion lithography; EUV lithography; Lithographie optique; Résine photosensible; Masque à décalage de phase; Correction d'effets de proximité;