Analysis of intensities of positive and negative ion species from silicon dioxide films using time-of-flight secondary ion mass spectrometry and electronegativity of fragments
Keywords: 33.15.Ry; 33.15.Ta; 36.40.âc; 68.49.Sf; 68.55.Jk; 77.55.+f; Silicon dioxide; Fragment species; Time-of-flight secondary ion mass spectrometry; Electronegativity;