
Assigning chemical configurations to the XPS features observed at pristine (1Â 0Â 0) Si surface resulting after etching in HF aqueous solution
Keywords: 68.35.Md; 68.45.Da; 82.30.Hk; 82.65.My; (1Â 0Â 0) Si surface; HF-etching of silicon; Inverse problem in XPS; XPS and infrared analysis of silicon surfaces;