TiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime
Keywords: رابط های بلورین-آمورف; Chemical vapor deposition; Synchrotron radiation photoelectron spectroscopy; X-ray absorption spectroscopy; Scanning tunneling microscopy; Growth; Titanium dioxide; Low index single crystal surfaces; Crystalline-amorphous interfaces;