TiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime

► Detailed study of metal organic chemical vapor deposition of TiO2 on Si(111). ► Surface chemistry of titanium(IV) tetra isopropoxide on Si(111), SiOx and TiO2. ► Understanding of the changeover from reaction-limited growth to flux-limited growth. ► Importance of the surface stability of carbonaceous compounds. ► The transition from an amorphous interface to crystalline anatase TiO2 was monitored.