Keywords: انرژی یونی; PEALD; Titanium dioxide; Capacitively coupled discharge; Ion energy;
مقالات ISI انرژی یونی (ترجمه نشده)
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Keywords: انرژی یونی; Si nanodots; Ar+ sputtering; Rotation; Ion flux; Ion energy
Keywords: انرژی یونی; Plasma immersion ion implantation; Implantation dose; Magnetic field; Ion incident angle; Ion energy;
Keywords: انرژی یونی; Laser ablation; Ion energy; Ion distribution; Angle resolved energy spectra; Anisimov model;
Impact of ion energies in Ar/H2 capacitively coupled radio frequency discharges on PEALD processes of titanium films
Keywords: انرژی یونی; PEALD; Titanium metal; Capacitively coupled discharge; Ion energy;
A comparative study of thick TiSiCN nanocomposite coatings deposited by dcMS and HiPIMS with and without PEMS assistance
Keywords: انرژی یونی; TiSiCN nanocomposite coatings; Plasma enhanced magnetron sputtering (PEMS); Hot filaments; Deep oscillation magnetron sputtering (DOMS); High power impulse magnetron sputtering (HiPIMS); Ion energy; Ion flux;
Effect of ion energy on microstructure and adhesion of diamond-like carbon on Ti6Al4V by ion beam deposition
Keywords: انرژی یونی; Diamond-like carbon; Ti6Al4V; Adhesion; Ion energy; Diamond nanoparticles;
Dependence of catalytic properties of indium-implanted SiO2 thin films on the energy and dose of incident indium ions
Keywords: انرژی یونی; Indium; Ion beam injection; Ion energy; SiO2 thin film; Catalyst;
Analysis of ion energy impact on the refractive index of silicon nitride films by use of neural network model
Keywords: انرژی یونی; Silicon nitride film; Plasma enhanced chemical vapor deposition; Duty ratio; Ion energy; Refractive Index; Neural network
About the temperature distribution in track forming insulators after the impact of swift heavy ions
Keywords: انرژی یونی; Insulators; Swift ions; Thermal spike; Tracks; Ion energy
Role of ion energy on growth and optical dispersion of nanocrystalline TiO2 films prepared by magnetron sputtering with ion assistance at the substrate
Keywords: انرژی یونی; Rutile TiO2; Reactive sputtering; Substrate bias; Ion energy; Optical dispersion;
Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process
Keywords: انرژی یونی; RF plasma; Ion energy; Thin films; Plasma diagnostics; Silicon oxide; Plasma assisted chemical vapor deposition; Hexamethyldisiloxane
Enhancement of hydrophobicity and tensile strength of muga silk fiber by radiofrequency Ar plasma discharge
Keywords: انرژی یونی; Radiofrequency plasma; Muga fiber; Self-compensated Langmuir and emissive probe; Ion energy; Hydrophobicity; Tensile strength;
Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4–N2 plasma at room temperature
Keywords: انرژی یونی; Silicon nitride film; Pulsed-plasma enhanced chemical vapor deposition; SiH4–N2; Room temperatures; Ion energy; Ion energy flux; Deposition rate; Radio frequency source power; Ion bombardment
Radio frequency source power effect on silicon nitride films deposited by a room-temperature pulsed-PECVD
Keywords: انرژی یونی; PECVD; Coating; Silicon nitride; Room temperature; Ion energy; Ion flux; Deposition rate; Duty ratio
Ion beam energy effects on structure and properties of SiOx doped diamond-like carbon films
Keywords: انرژی یونی; SiOx doped diamond-like carbon; Ion energy; XPS; Raman scattering spectra; AFM; Contact angle with water;
Investigation of processing parameters for pulsed closed-field unbalanced magnetron co-sputtered TiC–C thin films
Keywords: انرژی یونی; Pulsed DC magnetron sputtering; Nanocomposites; TiC; Ion energy
Sheath potential difference studies in low-pressure high-frequency capacitive RF plasma as a fundamental research for ion energy impinging on the material surface
Keywords: انرژی یونی; 52.40.Kh Plasma sheaths; 52.40.Hf Plasma–material interactions, boundary layer effects; 52.80.Pi High-frequency and RF dischargesRF sheath; Presheath; Potential difference; Ion energy
A comprehensive model of stress generation and relief processes in thin films deposited with energetic ions
Keywords: انرژی یونی; Stress generation; Stress relief; Annealing; Ion implantation; Ion energy; Ion assisted deposition; Model
TOF measurement of electron volt energy hydrogen atoms reflected by stainless-steel surface
Keywords: انرژی یونی; 52.25.Tx; Hydrogen; RF plasma; Ion energy; Energy reflection coefficient;