کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10401216 | 891166 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High-current-density electron emissions from nano-carbon films fabricated by high-power microwave-plasma chemical vapour deposition
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High-current-density electron emissions from nano-carbon films fabricated by high-power microwave-plasma chemical vapour deposition High-current-density electron emissions from nano-carbon films fabricated by high-power microwave-plasma chemical vapour deposition](/preview/png/10401216.png)
چکیده انگلیسی
Nano-structured carbon films were deposited on Si substrates by means of chemical vapour deposition with 3.8-kW microwave plasma. It was found from scanning electron microscope images and Raman spectra that the films were composed of nano-structured graphitic sheets with considerable disorder structures. Field emission (FE) characteristics measured from such films yielded high FE currents, being larger than 20 mA/cm2 at a macroscopic electric field of 10 V/μm. Short-term FE characteristics with standard deviations of â 5% were obtained for FE currents of â 0.3 mA/cm2 at 6 V/μm. A possible mechanism of the observed FEs is discussed in relation to a modified Fowler-Nordheim scheme, which considers field-dependent parameters with statistical distributions. Our proposed scheme allows an adequate description of the measured FE data, suggesting an increasing number of the emission sites with increasing the applied voltages in the nano-structured carbon films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 14, Issue 9, September 2005, Pages 1469-1473
Journal: Diamond and Related Materials - Volume 14, Issue 9, September 2005, Pages 1469-1473
نویسندگان
Jiayu Wang, Toshimichi Ito,