کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10401226 891166 2005 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Nanotribological and nanomechanical properties of 5-80 nm tetrahedral amorphous carbon films on silicon
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Nanotribological and nanomechanical properties of 5-80 nm tetrahedral amorphous carbon films on silicon
چکیده انگلیسی
Nanoscratch testing has been used to investigate the tribological behaviour of 5, 20, 60 and 80 nm tetrahedral amorphous carbon (ta-C) thin films deposited on silicon by the filtered cathodic vacuum arc method. The nanoscratch behaviour of the films was found to depend on the film thickness, with 60 and 80 nm films undergoing border cracking and then at higher critical load a dramatic delamination event. 5 and 20 nm films have a lower critical load for onset of border cracks but do not undergo a clear dramatic failure, and instead are increasingly worn/ploughed through until film removal as confirmed by microscopic analysis. This is consistent with the thinner films having lower stress and reduced load-carrying ability. Nanoindentation confirms that the thicker films have enhanced load support and higher measured composite (film + substrate) hardness. The 80 nm film in particular can retain appreciable load support whilst deformed during indentation, as shown by its ability to alter the critical loads for contact-induced phase transformations in the Silicon substrate during unloading.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 14, Issue 9, September 2005, Pages 1535-1542
نویسندگان
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