Formation of a FexSiyCz thin layer via PCV deposition of SiCN on a hot steel surface

In this work, it has been established that on steel plates heated to 600 °C, an FexSiyCz layer forms during plasma chemical vapor deposition of SiCN ceramics. As a plasma-forming agent, hexamethyldisilazane was used in the deposition, from which a SiCN product was formed. The deposited ceramic film is heterogeneous and consists of regions where predominantly FeSi2 or FexSiyCz is present. The thickness of the film is~0.8 μm. An investigation of the degradation of the ceramic film in tap water and a 3% aqueous NaCl solution at 26 and 60 °C demonstrated that FeSi2 corrodes first, and then FexSiyCz corrodes. The process was also analyzed using electrochemical techniques.