Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films

▶ Nickel is reactively sputtered in the presence of oxygen by dc magnetron sputtering. ▶ The substrate bias voltage was highly influenced the physical properties of NiO films. ▶ The films were preferentially grown along (200) orientation at all bias voltages. ▶ The NiO films with good microstructure have grown at bias voltage of −75 V. ▶ The films grown at −75 V have high transparency and low electrical resistivity.