Optimized scratch adhesion for TiSiN coatings deposited by a combination of DC and RF sputtering

► TiSiN coating was deposited using a combination of direct current (DC) and radio frequency (RF) PVD magnetron sputtering. ► The deposition processes were conducted by utilizing an L9 Taguchi orthogonal array. ► Variable input parameters were optimized for achieving high scratch adhesion strength of the TiSiN coatings. ► Optimization resulted in an increase of the critical load from 827 mN to 1371 mN, signifying an improvement of over 65%.