CFx thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization

► We successfully synthesized CFx (0.16 ≤ x ≤ 0.35) thin solid films by using HiPIMS. ► All as-deposited CFx films were found to exhibit an amorphous microstructure. ► CFx films with x ≤ 0.23 showed a graphitic nature. ► A polymeric structure for CFx films with x ?≥ 0.26 was found. ► DFT calculations showed plasma species and defects relevant for the film formation.