High density plasma assisted sputtering system for various coating processes

► We introduce DC remote plasma assisted sputtering source. ► Higher sputtering current (< 3.8 A) than RF excited remote plasma sputtering current(< 1 A). ► High target utilization efficiency (> 90%) of sputtering cathode. ► Independent control of sputtering voltage and current. ► Applicable from low voltage high current sputtering to high current high voltage sputtering.