A novel high-power pulse PECVD method

► An ionized plasma is generated by means of a hollow cathode discharge. ► Discharge can be sustained in DC mode, or in high-power pulsed (HiPP) mode. ► Amorphous, copper containing carbon coatings have been deposited at up to 30 μm/h. ► More efficient PECVD process by using HiPP + DC power, compared to DC power