Microstructure modifications of CrN coatings by pulsed bias sputtering

►Magnetron sputtering of CrN hard coatings with pulsed bias ►Asymmetric bipolar pulsed bias with different electron-to-ion flux ratios ►Electron bombardment increases adatom mobility and annealing without re-sputtering. ►Electron-to-ion flux ratio changes microstructure and mechanical properties. ►Variation of ion-to-atom flux ratio shifts turn-over in texture of CrN phase.