Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis

► Nanocrystalline Cr2O3 thin films were prepared by arc ion plating technique. ► Influence of substrate bias voltage on film growth process, microstructure, and characteristics was studied. ► Grain size and lattice constant of AIP Cr2O3 films were slightly changed by applying different bias voltages. ► Microstructure and surface morphology of AIP Cr2O3 films were greatly altered by substrate bias voltage and ion current density.