Effect of Hf on structure and age hardening of Ti-Al-N thin films

► Ab initio calculations enable for the prediction of as-deposited structures in Ti1 − x − yAlxHfyN. ► Additions of 5 mol% HfN in Ti1 − x − yAlxHfyN raise the formation temperature of w-AlN by ~ 200 °C. ► 10 at.% Hf at the metallic sublattice of Ti1 − x − yAlxHfyN protect from full oxidation at 950 °C for 20 h.