Electrodeposition of high Mo content amorphous/nanocrystalline Ni-Mo alloys using 1-methyl-imidazolium chloride ionic liquid as an additive

►In additive-free bath at pH of 8.5 poor codeposition of Mo with Ni is obtained. ►In the presence of 100 ppm IL at pH = 8.5 high Mo content Ni-Mo films were obtained. ►High Mo film developed here at 200 rpm whilst others obtained it under high convection. ►Substrate preparation affects on morphology of deposited Ni-Mo films.