Nanostructured thin films prepared from cluster beams

Plasma polymer nanostructures were prepared by cluster beam deposition. The nanocluster source assembled in our laboratory is implementing a 2 in. planar magnetron operated in radio-frequency mode and follows the Haberland concept. Clusters were deposited on glass or silicon substrates without mass separation in order to get high deposition rates. C:H plasma polymer clusters with a typical size of about 100 nm (measured by AFM) were prepared by RF discharge in argon/hexane atmosphere. The influence of deposition conditions was studied with respect to size distribution (AFM and SEM), chemical and physical properties (XPS and FTIR) of resultant clusters.