Growth kinetics of plasma deposited microcrystalline silicon thin films

► Simulation of the time evolution of plasma deposited μc-Si:H films structure and morphology. ► Edge effects on film thickness and structure uniformity. ► Calculation of time evolution of species and ions fluxes towards the surface. ► Calculations of stable silicon nuclei size on the glass - Si film - vacuum system. ► Mechanism of crystallization and frequencies of surface and gas-surface processes.