کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10668523 | 1008373 | 2011 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Fine temporal resolution of the measured probe characteristics revealed a decrease in the effective electron temperature Teff during pulse-ON time followed by a steady value at 0.6Â eV for all the pressures during the rest of the period. For the pressure of 2Â Pa, we observed a local maximum in Teff (0.9Â eV) at the end of cathode voltage pulse. Furthermore, during the pulse-OFF time we observed an exponential-like decay of the electron temperature for all the pressures. The plasma density demonstrated a steep increase during pulse-ON time followed by an exponential-like decrease during plasma OFF phase. The ion flux measurements have revealed approximately 3 times higher magnitude in the ion flux on the substrate at low pressure than at higher-pressures. The influence of these phenomena on the total energy flux at substrate and on thin film properties is discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S317-S321
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S317-S321
نویسندگان
Martin Äada, ZdenÄk HubiÄka, Petr Adámek, Jan KlusoÅ, LubomÃr JastrabÃk,