کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10668598 | 1008385 | 2010 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of NbN and ZrN films formed by magnetron sputtering on Ti and porcelain bonding
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Niobium nitride (NbN) and zirconium nitride (ZrN) were deposited on Ti substrates by direct-current (DC) reactive magnetron sputtering; the deposited NbN and ZrN films served as intermediate layers of a Ti and porcelain interface. X-ray diffraction (XRD) results proved that the deposited NbN and ZrN films were polycrystalline with a cubic microstructure. The Ti and porcelain bonding strength of the samples in Group Control (27.2 ± 0.75 MPa), Group NbN (43.1 ± 0.59 MPa), and Group ZrN (52.4 ± 0.80 MPa) were measured. The surface roughness in the case of Group Control (1.863 ± 0.10 μm), Group NbN (2.343 ± 0.07 μm), and Group ZrN (2.346 ± 0.10 μm) was also investigated. Statistical analysis showed that both films helped improve the Ti and porcelain bonding strength and increase the surface roughness. Scanning electron microscopy (SEM) results showed that no apparent oxide layer was formed at the Ti and porcelain interface in both Group NbN and Group ZrN. Energy-dispersive X-ray spectroscopy (EDS) results showed that ZrN was more effective in preventing Ti oxidation than was NbN. Overall, the experimental results showed that the deposition of both NbN and ZrN films helps improve the Ti and porcelain bonding strength and that ZrN films are more effective.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 205, Issue 7, 25 December 2010, Pages 1886-1891
Journal: Surface and Coatings Technology - Volume 205, Issue 7, 25 December 2010, Pages 1886-1891
نویسندگان
Shu-Shu Wang, Yang Xia, La-Bao Zhang, Han-Bing Guang, Ming Shen, Fei-Min Zhang,