کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10668945 | 1008487 | 2005 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Microstructure and tribological properties of SiOx/DLC films grown by PECVD
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The structural modification of pure DLC films was attempted by the addition of Siî¸O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 194, Issue 1, 20 April 2005, Pages 128-135
Journal: Surface and Coatings Technology - Volume 194, Issue 1, 20 April 2005, Pages 128-135
نویسندگان
Won Jae Yang, Tohru Sekino, Kwang Bo Shim, Koichi Niihara, Keun Ho Auh,