کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10672755 1010001 2005 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition
چکیده انگلیسی
The effect of the substrate was also argued by comparing the above results with the simulation results obtained for a point-like starting substrate. Surprisingly, the shapes of the deposits grown on bulk substrates were reproduced well by the simulations starting from point-like substrates indicating the small effect of the substrate on the shape of deposits.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 103, Issue 1, April 2005, Pages 17-22
نویسندگان
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