کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10674728 | 1010428 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Creation of microstructures using heavy ion beam lithography
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Creation of microstructures using heavy ion beam lithography Creation of microstructures using heavy ion beam lithography](/preview/png/10674728.png)
چکیده انگلیسی
In this work, three-dimensional (3D) structures were produced in PMMA and CR-39 polymer resists using a carbon ion microbeam. To investigate possible advantages of heavy ions compared to the well-established proton beam lithography, the same resist materials were also irradiated with protons that had a range in the materials studied here similar to that of carbon ions. The microstructures produced in different resists were analysed after chemical etching. The quality of the bottom and side walls of the structures produced by protons and carbon ions were compared using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The results showed that, for the resist materials tested, lithographic structures made with the 8Â MeV carbon beam had more rough lateral and bottom surfaces compared to those made with 0.6Â MeV proton beam lithography.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 269, Issue 20, 15 October 2011, Pages 2413-2416
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 269, Issue 20, 15 October 2011, Pages 2413-2416
نویسندگان
M. VaraÅ¡anec, I. BogdanoviÄ RadoviÄ, Ž. PastuoviÄ, M. JakÅ¡iÄ,