Plasma parameter analysis of Ag sputter deposition using cathodes with different magnetic flux densities

► Effect of magnetic flux density of Ag sputter target on plasma parameters was studied. ► Langmuir probe system was used for the evaluation. ► The electron energy and density of plasma decreased using high magnetic flux density. ► The resistivity of Ag thin films decreased using high magnetic flux density. ► This resistivity improvement related to the plasma parameter changes.